Application technology of Anti-fog materials

Anti-fog material is a ring-shaped network structure composed of polar bonds, which can adsorb or polarize polar water molecules. The water molecules are dispersed, induced, adsorbed, repelled and separated due to the sudden drop in surface tension. The material is transparent and has no absorption in the visible light region.

Material application parameters and performance：

1) This type of material is a high-temperature stable cyclic non-polar mixture, which suitable for anti-fogging on metal, glass and the surface of various organic / inorganic materials.

2) In general, FW -1 can be used alone, and the recommended thickness is 200 nm. Under special circumstances, we can use FW-2 to enhance the hardness, the recommended thickness is 50~100nm.

3) Suitable for W, Mo, Ta etc. resistance evaporation or electron beam evaporation, melting evaporation, evaporation temperature 1200~1600℃, the recommended evaporation rate is 0.5~2nm/s.

4) During evaporation, ion source assistance and thermal baking (150~350℃) can significantly enhance film firmness and hardness;

5) The evaporation conditions of Japanese OTMC-1300 coating machine: loading capacity 8g, background vacuum 4x10-3 Pa, coating vacuum 8x10-3 Pa, substrate temperature 250 ℃, evaporation rate 5A/s.

Coating conditions：

1) Glass substrate: coating vacuum 8x10 -3 Pa, thermal baking (150~350℃) evaporation, thermal energy stabilize film structure;

2) Plastic (resin) substrate: before evaporation, the ion source scans the substrate with medium intensity; enhanced ion source assisted coating during evaporation. Ion energy stabilizes the film structure. It is recommended that the film thickness be increased to -1μm.

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